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Advanced Process Systems represents advanced
development in semiconductor manufacturing
with advanced
Chemical Mechanical Planarization, Post Chemical
Mechanical Planarization
Cleaners, Electro-deposition of Photo
Resist, Electro-deposition of Metals,
Electroless Under Bump Metallization (UBM),
Megasonic Wafer Cleaners and
Research &
Development contract fabrication centers for
MEMS, Optoelectronics and 3-D Advanced
Packaging.
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Advanced Process Systems, is committed to
providing next generation manufacturing
equipment for product development through
full production in the semiconductor
development areas of MEMS, WLP, MCM, 3-D
advanced packaging, compound semiconductor, electroless
under bump metallization,
chemical mechanical planarization and many
diverse areas of advanced packaging.
Representing cost effective equipment for
R&D through production in the manufacturing
areas of
Chemical Mechanical Planarization (CMP),
Electroless Under Bump Metallization (Electroless
UBM) and Electrodeposition of Photoresist
(ED Photo Resist Coater). With our third
generation ED Photoresist Coater system the electrodeposition of photoresist is an enabling technology for 3-D advanced
packaging applications and next generation
development. Our R&D Contract Fab for MEMS and 3-D advanced packaging
development provides the
most multi-disciplinary staff of scientist,
engineers, and physicist of any
R&D contract Fab in the United States.
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